Growth of a textured quasicrystalline phase in Ti-Ni-Zr films prepared by pulsed laser deposition

Valerie Brien (1, 2) , A. Dauscher (2) , P. Weisbecker (3) , F. Machizaud

1 IMN - Institut des Matériaux Jean Rouxel
2 IJL - Institut Jean Lamour
3 LCTS - Laboratoire des Composites Thermostructuraux

The preparation in thin film form of the known icosahedral phase in Ti-Ni-Zr bulk alloys has been investigated as a function of substrate temperature. Films were deposited by Pulsed Laser Deposition on sapphire substrates at temperatures ranging from room temperature to 350°C. Morphological and structural modifications have been followed by grazing incidence and θ-2θ X-ray diffraction, transmission electron diffraction and imaging. Chemical composition has been analysed by Electron Probe Micro-Analysis. The in-depth variation of composition has been studied by Secondary Neutral Mass Spectroscopy. We show that Pulsed Laser Deposition at 275°C makes the formation of a 1 m thick film of Ti-Ni-Zr quasicrystalline textured nanocrystallites possible.

Mots clés: Quasicrystals 6855 Nq; Thin film: 6855a; Texture: 6855Jk; Pulsed laser deposition: 8115 Fg

Domaines: Optique [physics.optics]; Chimie inorganique; Science des matériaux [cond-mat.mtrl-sci]; Matériaux

Valerie Brien, A. Dauscher, P. Weisbecker, F. Machizaud. Growth of a textured quasicrystalline phase in Ti-Ni-Zr films prepared by pulsed laser deposition. Applied physics. A, Materials science & processing, 2003, 76 (2), pp.187-195. ⟨10.1007/s003390201405⟩. ⟨hal-02882481⟩